Expansion of lattice constants of aluminum nitride thin film prepared on sapphire substrate by ECR plasma sputtering method
Expansion of lattice constants of aluminum nitride thin film prepared on sapphire substrate by ECR plasma sputtering method
复制标题
ECR等离子体溅射法在蓝宝石衬底上制备氮化铝薄膜晶格常数的扩展
DOI：
10.7567/jjap.53.11ra11
复制
发表时间：
2014
影响因子：
1.5
通讯作者：
M Yoshimoto
中科院分区：
文献类型：
--
作者：
S Kaneko;H Torii;T Amazawa;T Ito;M Yasui;M Kurouchi;A Fukushima;T Tokumasu;S Lee;S Park;H Takikawa;M Yoshimoto
