High-pressure phases in nanocrystalline Co(C) films obtained by pulsed plasma vaporization
High-pressure phases in nanocrystalline Co(C) films obtained by pulsed plasma vaporization
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脉冲等离子体汽化获得的纳米晶 Co(C) 薄膜中的高压相
DOI：
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发表时间：
2000
期刊：
影响因子：
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通讯作者：
V. S. Zhigalov
中科院分区：
文献类型：
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作者：
R. Iskhakov;S. Stolyar;L. Chekanova;E. Artem’ev;V. S. Zhigalov
通过对纳米晶Co(C)薄膜的原子结构和磁性的研究，发现了用脉冲等离子体蒸发技术制备的纳米晶Co(C)薄膜的相组成。在衬底温度T=50℃下沉积的薄膜为异相结构，由过饱和的Co(C)固溶体和亚稳态的Co3C碳化物组成。在T=150℃时得到的薄膜是亚稳态Co3C和Co2C碳化物的机械混合物。在纳米晶态下获得的Co3C和Co2C亚稳碳化物为高压相(∼100kbar)。确定了这些亚稳相的热稳定性范围。
The phase composition of nanocrystalline Co(C) films obtained by a new pulsed plasma vaporization technique was found by studying their atomic structure and magnetic properties. The films deposited at the substrate temperature T=50°C were of heterophase structure and consisted of a supersaturated solid Co(C) solution and the metastable Co3C carbide. The films obtained at T=150°C represented a mechanical mixture of the metastable Co3C and Co2C carbides. The metastable Co3C and Co2C carbides obtained in a nanocrystalline state were high-pressure phases (∼100 kbar). The thermal stability ranges of these metastable phases were determined.