Quantitative Raman Spectrum and Reliable Thickness Identification for Atomic Layers on Insulating Substrates
Quantitative Raman Spectrum and Reliable Thickness Identification for Atomic Layers on Insulating Substrates
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DOI:
10.1021/nn3025173
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发表时间:
2012-08-01
期刊:
影响因子:
17.1
通讯作者:
Tsukagoshi, Kazuhito
中科院分区:
文献类型:
--
作者:
Li, Song-Lin;Miyazaki, Hisao;Tsukagoshi, Kazuhito
We demonstrate the possibility in quantifying the Raman intensities for both specimen and substrate layers In a common stacked experimental configuration and, consequently, propose a general and 4 Excitation Raman scattering rapid thickness identification technique for atomic-scale layers on Unprecedentedly wide-range Raman data for atomically flat MoS2 flakes are collected to compare with theoretical models. We reveal that all intensity features can be accurately captured when including optical interference effect. Surprisingly, we find that even freely suspended chalcogenide few-layer flakes have a stronger Raman response than that from the bulk phase. Importantly, despite the oscillating intensity of specimen spectrum versus thickness, the substrate weighted spectral intensity becomes monotonic. Combined with its sensitivity to specimen thickness, we suggest this quantity can be used to rapidly determine the accurate thickness for atomic layers.