Determination of flux ionization fraction using a quartz crystal microbalance and a gridded energy analyzer in an ionized magnetron sputtering system
Determination of flux ionization fraction using a quartz crystal microbalance and a gridded energy analyzer in an ionized magnetron sputtering system
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在电离磁控溅射系统中使用石英晶体微天平和网格能量分析仪测定通量电离分数
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发表时间：
1997
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通讯作者：
D. Ruzic
中科院分区：
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作者：
K. Green;D. Hayden;D. Juliano;D. Ruzic
本文介绍了一种结合石英晶体微天平（QCM）和栅网能量分析仪的直流磁控溅射金属通量电离率诊断仪。传感器安装在线性运动馈通上，并嵌入在衬底平面中的槽中，以允许测量整个晶片平面上的沉积和电离的均匀性。通过线圈引入射频（rf）功率以使Al原子取向。在QCM的金属通量电离分数是通过比较总的沉积速率与没有偏置，筛选出的离子，但留下等离子体不受干扰。通过改变施加到栅极的电压，确定等离子体电势。在35 mTorr的压力下，磁控管功率为2 kW，净射频功率为310±5 W，发现电离率为78±5%。
A diagnostic which combines a quartz crystal microbalance (QCM) and a gridded energy analyzer has been developed to measure the metal flux ionization fraction in a modified commercial dc magnetron sputtering device. The sensor is mounted on a linear motion feedthrough and embedded in a slot in the substrate plane to allow for measuring the uniformity in deposition and ionization throughout the plane of the wafer. Radio-frequency (rf) power is introduced through a coil to ionize the Al atoms. The metal flux ionization fraction at the QCM is determined by comparing the total deposition rate with and without a bias that screens out the ions, but that leaves the plasma undisturbed. By varying the voltage applied to the grids, the plasma potential is determined. At a pressure of 35 mTorr, a magnetron power of 2 kW, and a net rf power of 310±5 W, 78±5% ionization was found.