MODEL FOR A LOW CURRENT VACUUM ARC CATHODE REGION. EFFECT OF THE ELECTRONIC TEMPERATURE
MODEL FOR A LOW CURRENT VACUUM ARC CATHODE REGION. EFFECT OF THE ELECTRONIC TEMPERATURE
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发表时间：
2006
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通讯作者：
M. Messaad;A. Belarbi;A. Lefort
中科院分区：
文献类型：
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作者：
M. Messaad;A. Belarbi;A. Lefort
电弧阴极区的实验和理论研究已经进行了几十年，尽管有许多努力和进展，但任务尚未完成。在这项工作中，一个数值模型描述电弧阴极区的开发。然后将该模型应用于低电流（4- 50 A）下真空电弧放电与铜阴极相互作用的研究。该模型给出了阴极表面的温度和电场强度、发射的电子和总电流密度、阴极光斑半径、加热和冷却阴极的不同功率密度以及等离子体电子密度。与实验结果的比较表明，良好的协议。
SUMMARY Experimental and theoretical studies of arc cathode region have been made during several decades and the task is not yet completed, in spite of many efforts and progress. In this work, a numerical model describing the arc cathode region is developed. The model is then applied to a vacuum arc discharge interacting with a Cu cathode at low current (4-50A). The model yields the temperature and electric field strength at the cathode surface, electrons emitted and total current density, cathode spot radius, different kinds of power densities heating and cooling the cathode, and the plasma electron density. The comparison with experimental results shows good agreements.