Patterned colloid assembly by grafted photochromic polymer layers
Patterned colloid assembly by grafted photochromic polymer layers
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DOI：
10.1021/la051636c
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发表时间：
2006-02-14
期刊：
影响因子：
3.9
通讯作者：
Braun, PV
中科院分区：
文献类型：
--
作者：
Piech, M;George, MC;Braun, PV
石英表面和胶态二氧化硅颗粒衍生化与聚（甲基丙烯酸甲酯）共聚物含有螺苯并吡喃（SP）光致变色分子在侧基中的浓度为20摩尔%。然后使用双光子近红外激发（类似于780 nm）通过SP转化为两性离子汞（MC）异构体的光致变色过程在改性表面上产生化学上不同的图案。衍生胶体吸附到光开关，MC区域的可能性约为10倍。表面覆盖率和吸附动力学进行了比较，不可逆单层吸附的平均场模型。
Quartz surfaces and colloidal silica particles were derivatized with a poly(methyl methacrylate) copolymer containing spirobenzopyran (SP) photochromic molecules in the pendant groups at a concentration of 20 mol %. Two-photon near-IR excitation (similar to 780 nm) was then used to create chemically distinct patterns on the modified surfaces through a photochromic process of SP transformation to the zwitterionic merocyanine (MC) isomer. The derivatized colloids were approximately 10 times more likely to adsorb onto the photoswitched, MC regions. Surface coverage and adsorption kinetics have been compared to the mean-field model of irreversible monolayer adsorption.