Thin liquid film lubrication under external electrical fields: Roles of liquid intermolecular interactions

Thin liquid film lubrication under external electrical fields: Roles of liquid intermolecular interactions
复制标题

外部电场下的薄液膜润滑:液体分子间相互作用的作用

DOI:
10.1063/1.3587477
复制
发表时间:
2011-06
影响因子:
3.2
通讯作者:
Zhang, Chenhui
Zhang, Chenhui
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Xie, Guoxin;Luo, Jianbin;Liu, Shuhai;Guo, Dan;Zhang, Chenhui

文献摘要

参考文献

被引文献

相似文献

纳米级液膜润滑的重要特征之一是在固/液界面处形成有序层。在本文中,通过测量集中点接触中液体的中心膜厚度,然后推断薄膜流变性,研究了液体润滑膜中分子间相互作用对施加外部电场(EEF)后形成有序层的影响。研究发现,纯液态正构烷烃和长链液态正醇的成膜性能对EEF的响应较弱,而其混合溶液的成膜性能则能更显着地被EEF增强。此外,还讨论了 EEF 下溶剂分子之间的分散相互作用对润滑薄膜中有序层形成的影响。
One of the important features of the nanoscale liquid film lubrication is the formation of ordered layers at the solid/liquid interface. In this paper, the effect of the intermolecular interaction in liquid lubricant films on the formation of ordered layers after applying external electric fields (EEFs) has been investigated by measuring the central-film-thicknesses of liquids in concentrated point contacts and then inferring the thin film rheology. It has been found that the film formation properties of both pure liquid n-alkanes and liquid n-alcohols with relatively long chains have weak responses to EEFs, while those of their mixed solutions could be enhanced more notably by EEFs. In addition, the effect of the dispersive interactions between solvent molecules on the formation of ordered layers in thin lubrication films under EEFs was also discussed.
DOI: 10.1063/1.2827176
发表时间: 2007-12
影响因子: 4
作者:
Chenhui Zhang;Liran Ma;Shuhai Liu;Xinchun Lu
通讯作者: Xinchun Lu
DOI: 10.1038/nature02750
发表时间: 2004-07-29
期刊: NATURE
影响因子: 64.8
作者:
Urbakh, M;Klafter, J;Israelachvili, J
通讯作者: Israelachvili, J
DOI: 10.1115/1.3453074
发表时间: 1977-01-01
期刊: JOURNAL OF LUBRICATION TECHNOLOGY-TRANSACTIONS OF THE ASME
影响因子: --
作者:
HAMROCK, BJ;DOWSON, D
通讯作者: DOWSON, D
DOI: 10.1063/1.3400653
发表时间: 2010-05
期刊: The Journal of chemical physics
影响因子: --
作者:
Samanvaya Srivastava;P. D. S. Reddy;Cindy Wang;D. Bandyopadhyay;Ashutosh Sharma
通讯作者: Samanvaya Srivastava;P. D. S. Reddy;Cindy Wang;D. Bandyopadhyay;Ashutosh Sharma
DOI: 10.1115/1.2032991
发表时间: 2005-10
影响因子: 2.5
作者:
I. Křupka;M. Hartl;M. Liska
通讯作者: I. Křupka;M. Hartl;M. Liska