Chemical vapour deposition of polycrystalline AlN films from AlCl3-NH3 mixtures: II:surface morphology and mechanisms of preferential orientation at low-pressure
Chemical vapour deposition of polycrystalline AlN films from AlCl3-NH3 mixtures: II:surface morphology and mechanisms of preferential orientation at low-pressure
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DOI：
10.1016/s0040-6090(01)01792-8
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发表时间：
2002-03
期刊：
影响因子：
2.1
通讯作者：
A. Dollet;Y. Casaux;M. Matecki;R. Rodríguez-Clemente
中科院分区：
文献类型：
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作者：
A. Dollet;Y. Casaux;M. Matecki;R. Rodríguez-Clemente
