Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis
Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis
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基于质谱仪测量和机器学习分析的氢化非晶碳薄膜的沉积前驱体对等离子体蚀刻抗性的影响
DOI：
10.1016/j.vacuum.2022.111351
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发表时间：
2022
期刊：
影响因子：
4
通讯作者：
Hori Masaru
中科院分区：
文献类型：
--
作者：
Kurokawa Jumpei;Kondo Hiroki;Tsutsumi Takayoshi;Ishikawa Kenji;Sekine Makoto;Hori Masaru
