Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) –Relation between Resist Space Resolution and Space Distribution of Ionic Species–
Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) –Relation between Resist Space Resolution and Space Distribution of Ionic Species–
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研究微观区域的辐射诱发反应，以基本了解光刻工艺中的电子束图案化（II）–抗蚀剂空间分辨率与离子物质空间分布之间的关系–
DOI：
10.1143/jjap.41.4213
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发表时间：
2001
影响因子：
1.5
通讯作者：
S. Tagawa
中科院分区：
文献类型：
--
作者：
A. Saeki;T. Kozawa;Y. Yoshida;S. Tagawa
为了进行电子束曝光的基础研究，测量了随时间变化的分布。在纳米尺度电子束光刻的情况下，离子种类的分布被认为对空间分辨率或线边缘粗糙度具有影响。作为抗蚀剂树脂的模型化合物，使用液体正十二烷作为样品。实验采用亚皮秒脉冲辐解技术。基于电场中的扩散模型，对实验数据进行了Monte Carlo模拟分析。模拟数据通过响应函数进行卷积，并与实验数据拟合。通过将阳离子自由基的时间依赖行为转化为阳离子自由基-电子距离的分布函数，得到了时间依赖分布。讨论了空间分辨率与离子种类空间分布的关系。
For basic research on electron beam lithography, the time-dependent distribution was measured. In the case of nano-scale electron beam lithography, the distribution of ionic species is thought to have an influence on the space resolution or the line edge roughness. As a model compound of a resist resin, liquid n-dodecane was used as a sample. The experiment was carried out using the subpicosecond pulse radiolysis. The experimental data was analyzed by Monte Carlo simulation based on the diffusion in an electric field. The simulation data were convoluted by the response function and fitted to the experimental data. By transforming the time-dependent behavior of cation radicals to the distribution function of cation radical-electron distance, the time-dependent distribution was obtained. Subsequently, the relation between the space resolution and the space distribution of ionic species was discussed.