Electroreduction of Perchlorinated Silanes for Si Electrodeposition
Electroreduction of Perchlorinated Silanes for Si Electrodeposition
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DOI：
10.1149/1945-7111/abda58
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发表时间：
2021-02-01
影响因子：
3.9
通讯作者：
Maldonado, Stephen
中科院分区：
文献类型：
--
作者：
Downes, Nathanael;Cheek, Quintin;Maldonado, Stephen
研究了六氯二硅烷和四（三氯硅基）硅烷作为Si-EC-LLS电沉积前驱体在几种电解液中的电化学反应性和适用性。伏安数据表明，无论前体中的Si-Si键含量如何，全氯化硅烷都表现出与SiCl 4相似的电化学响应机理。的伏安响应是一个强大的功能的前体的浓度，表明参与还原和伴随的Si电沉积过程中的电生成的中间体。支持电解质中阴离子的变化被认为是前体浴的热稳定性和化学稳定性的关键因素。计时电流法和电子显微镜数据的组合被用来研究沉积效率，特别是六氯乙硅烷。的法拉第效率是低的，无论过电位或组成的电解质。累积地，这些数据显示，虽然较大的氯硅烷可以在较宽范围的条件下用于常规的Si电沉积，但是它们的化学不稳定性和低法拉第效率的倾向限制了它们相对于SiCl 4作为用于通过ec-LLS的Si电沉积的试剂的效用。
The electrochemical reactivity and suitability of hexachlorodisilane and tetrakis(trichlorosilyl)silane as Si ec-LLS electrodeposition precursors in several electrolyte solutions have been investigated. Voltammetric data indicated that perchlorinated silanes exhibit mechanistically similar electrochemical responses as SiCl4, regardless of the Si-Si bond content in the precursor. The voltammetric responses were a strong function of the concentration of the precursor, indicating the participation of electrogenerated intermediates during the reduction and concomitant Si electrodeposition. Variation of the anion in the supporting electrolyte was found to be a critical factor for the thermal and chemical stability of the precursor bath. A combination of chronoamperometry and electron microscopy data were used to study the deposition efficiency specifically for hexachlorodisilane. The faradaic efficiency was low, regardless of overpotential or the composition of the electrolyte. Cumulatively, these data show that while larger chlorosilanes can be used for conventional Si electrodeposition over a wider range of conditions, their chemical instability and propensity for low faradaic efficiency limit their utility as reagents relative to SiCl4 for Si electrodeposition by ec-LLS.