Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU
Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU
复制标题
NewSUBARU 利用相干极紫外散射显微镜测量极紫外掩模的临界尺寸
DOI：
10.1143/jjap.50.06gb03
复制
发表时间：
2011
期刊：
影响因子：
--
通讯作者：
and Hiroo Kinoshita
中科院分区：
文献类型：
--
作者：
Tetsuo Harada;Masato Nakasuji;Masaki Tada;Yutaka Nagata;Takeo Watanabe;and Hiroo Kinoshita
我们已经开发了一个相干的极紫外散射显微镜（CSM）的光化检测和计量的极紫外（EUV）掩模。它安装在NewSUBARU同步辐射设施的BL-3光束线上。CSM是一个没有物镜的无透镜系统，使用记录的衍射图像估计空间图像和临界尺寸（CD）值。提出了一种利用衍射强度重建空间图像来测量CD值的方法。光化法的重复性为0.3nm（3σ），精度高。我们还评估了CD均匀性的88 nm的线和空间的图案上完成的EUV掩模，这对应以及通过临界尺寸扫描电子显微镜（CD-SEM）的结果。
We have developed a coherent extreme ultraviolet scatterometry microscope (CSM) for actinic inspection and metrology of an extreme ultraviolet (EUV) mask. It was installed at the BL-3 beamline of the NewSUBARU synchrotron radiation facility. The CSM is a lens-less system with no objective, and aerial images and critical dimension (CD) values are estimated using the recorded diffraction image. A method of measuring CD values by reconstruction of aerial images using diffraction intensity has been developed. A repeatability of 0.3 nm (3σ) with a high precision is achieved with the actinic method. We also evaluate the CD uniformity of the 88 nm lines-and-spaces patterns on the finished EUV mask, which corresponds well with that obtained by critical-dimension scanning electron microscopy (CD-SEM) results.