Preparation of superhydrophobic silicon oxide nanowire surfaces
Preparation of superhydrophobic silicon oxide nanowire surfaces
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DOI：
10.1021/la063345p
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发表时间：
2007-02-13
期刊：
影响因子：
3.9
通讯作者：
Boukherroub, Rabah
中科院分区：
文献类型：
--
作者：
Coffinier, Yannick;Janel, Sebastien;Boukherroub, Rabah
本文报道了用表面粗糙度和自组装的方法在接触角大于150度的硅衬底上制备超疏水非晶态氧化硅纳米线。通过所谓的固-液-固(SLS)技术得到了平均直径在20-150 nm，长度在15-20微米之间的纳米线。AFM成像证实了所得表面的多孔性和高粗糙度。这种超疏水性是表面粗糙度和氟代十二烷基三氯硅烷化学修饰的共同作用的结果。
The paper reports on the preparation of superhydrophobic amorphous silicon oxide nanowires (a-SiONWs) on silicon substrates with a contact angle greater than 150 degrees by means of surface roughness and self-assembly. Nanowires with an average mean diameter in the range 20-150 nm and 15-20 mu m in length were obtained by the so-called solid-liquid-solid (SLS) technique. The porous nature and the high roughness of the resulting surfaces were confirmed by AFM imaging. The superhydrophobicity resulted from the combined effects of surface roughness and chemical modification with fluorodecyl trichlorosilane.