Nuclear-Polarized Phases of H Atoms Embedded in Solid Molecular Hydrogen Films
Nuclear-Polarized Phases of H Atoms Embedded in Solid Molecular Hydrogen Films
复制标题
嵌入固体分子氢膜中的氢原子的核极化相
DOI:
10.1007/s10909-021-02627-2
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发表时间:
2021
影响因子:
2
通讯作者:
Vasiliev, S.
中科院分区:
文献类型:
--
作者:
Sheludiakov, S.;Lee, D. M.;Khmelenko, V. V.;Ahokas, J.;Järvinen, J.;Vasiliev, S.
We report on an electron-spin resonance study of nuclear-polarized phases of hydrogen atoms embedded in solid Hfilms at temperatures 0.1–1.5 K and a high magnetic field of 4.6 T. The H atoms in solid Hwere generated by two different dissociation techniques: a cryogenic rf-discharge and bombardment by 5.7 keV electrons via tritium decay. In both studies, we observed a build-up of a spontaneous nuclear-polarized phase (SNPP,p=0.35) at temperatures below0.8 K similar to that reported in our previous work. We were also able to create a highly nuclear-polarized phase (HNPP,0.75) using Dynamic Nuclear Polarization for samples exposed to a cryogenic rf discharge, whereas we failed to obtain this phase for the samples bombarded by 5.7 keV electrons. We suggest that failing to achieve the HNPP in the samples exposed to high-energy electrons released during tritium decay may be explained by an effect of faster nuclear relaxation stimulated by electrons bombarding the Hmatrix and rapidly relaxing centers in the film substrate created during accumulation of H atoms in solid H.
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影响因子:
3.7
作者:
Sheludiakov, S.;Ahokas, J.;Järvinen, J.;Lehtonen, L.;Vasiliev, S.;Dmitriev, Yu. A.;Lee, D. M.;Khmelenko, V. V.
通讯作者:
Khmelenko, V. V.
影响因子:
8.6
作者:
Haziot, Ariel;Rojas, Xavier;Balibar, Sebastien
通讯作者:
Balibar, Sebastien
影响因子:
0.8
作者:
Sheludiakov, S.;Lee, D. M.;Khmelenko, V. V.;Ahokas, J.;Järvinen, J.;Vasiliev, S.
通讯作者:
Vasiliev, S.
影响因子:
8.6
作者:
S. Sheludiakov;J. Ahokas;J. Järvinen;D. Zvezdov;O. Vainio;L. Lehtonen;S. Vasiliev;S. Mao;V. Khmelenko;D. M. Lee
通讯作者:
D. M. Lee
影响因子:
1.6
作者:
S. Sheludiakov;J. Ahokas;O. Vainio;J. Järvinen;D. Zvezdov;S. Vasiliev;V. Khmelenko;S. Mao;David M. Lee
通讯作者:
David M. Lee