Tailored Ag nanoparticle array fabricated by block copolymer photolithography
Tailored Ag nanoparticle array fabricated by block copolymer photolithography
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DOI：
10.1016/j.tsf.2007.04.126
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发表时间：
2008-03-03
期刊：
影响因子：
2.1
通讯作者：
Iyoda, Tomokazu
中科院分区：
文献类型：
--
作者：
Li, Jingze;Kamata, Kaori;Iyoda, Tomokazu
利用嵌段共聚物光刻技术在各种固体衬底上制备了金属银纳米颗粒的周期性阵列，在纳米电子学和纳米光子学领域具有潜在的应用前景。采用具有有序、垂直取向的圆柱形纳米畴的自旋涂覆二嵌段共聚物薄膜作为模板。通过在薄膜上滴入几滴AgNO3水溶液，可以选择性地将Ag+掺杂到圆柱形纳米畴中。在真空紫外光照射下，实现了银+光化学还原为金属银和双嵌段共聚物模板的光刻，从而将双嵌段共聚物模板的周期模式直接转录到金属银纳米粒子阵列上，并具有一致的周期性。(c) 2007 Elsevier B.V.版权所有
Periodic arrays of metallic Ag nanoparticles have been fabricated on various solid substrates for the potential application in nano-electronics and nano-photonics by block copolymer photolithography. Spin-coated diblock copolymer thin film with well-ordered and vertically oriented cylindrical nanodomains was utilized as the template. Ag+ was selectively doped in the cylindrical nanodomain by just placing a few drops of AgNO3 aqueous solution on the film. Both photochemical reduction of Ag+ to metallic Ag and concomitant photo-etching of the diblock copolymer template have been achieved under vacuum ultraviolet light irradiation, resulting in a direct transcription of the periodic pattern of diblock copolymer template to the metallic Ag nanoparticle array with the consistent periodicity. (c) 2007 Elsevier B.V. All rights reserved.