Ultra-low voltage (0.1V) operation of Vth self-adjusting MOSFET and SRAM cell

Ultra-low voltage (0.1V) operation of Vth self-adjusting MOSFET and SRAM cell
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DOI:
10.1109/vlsit.2014.6894416
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发表时间:
2014-06
期刊:
2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers
影响因子:
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通讯作者:
A. Ueda;Seungmin Jung;T. Mizutani;Ashok Kumar;T. Saraya;T. Hiramoto
A. Ueda;Seungmin Jung;T. Mizutani;Ashok Kumar;T. Saraya;T. Hiramoto
中科院分区:
其他
文献类型:
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作者:
A. Ueda;Seungmin Jung;T. Mizutani;Ashok Kumar;T. Saraya;T. Hiramoto

文献摘要

相似文献

提出了一种由浮栅构成的Vth自调整MOSFET,并成功地实现了Vth自调整和SRAM单元在0.1V以下的超低电压工作。在该器件中,Vth在接通状态时自动降低,在关断状态下自动增加,从而获得高的离子/离子关断比以及在低Vdd时稳定的SRAM操作。在具有Vth自调整nFET和pFET的6T SRAM单元中,实验证明最小工作电压为0.1V。
A Vth self-adjusting MOSFET consisting of floating gate is proposed and the ultra-low voltage operation of the Vth self-adjustment and SRAM cell at as low as 0.1V is successfully demonstrated. In this device, Vth automatically decreases at on-state and increases at off-state, resulting in high Ion/Ioff ratio as well as stable SRAM operation at low Vdd. The minimum operation voltage at 0.1V is experimentally demonstrated in 6T SRAM cell with Vth self-adjusting nFETs and pFETs.