New measurement-based technique for RF LDMOS nonlinear modeling
New measurement-based technique for RF LDMOS nonlinear modeling
复制标题
用于 RF LDMOS 非线性建模的基于测量的新技术
DOI:
10.1109/75.735416
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发表时间:
1998
期刊:
影响因子:
--
通讯作者:
A. Suárez
中科院分区:
文献类型:
--
作者:
J. Collantes;J. J. Raoux;R. Quéré;A. Suárez
In this letter a new look-up table model is developed for the nonlinear modeling of radio frequency (RF) LDMOS transistors. The modeling technique is based on the use of approximation splines that are coupled to a pulsed I-V characterization setup. It provides a very fast modeling procedure, while avoiding the appearance of undesired ripples in the modeled functions. The technique has been applied to a RF LDMOS technology for L-band applications, obtaining excellent results in the prediction of both the small- and large-signal transistor responses. This technique is specially suitable for fast-evolution technologies.