Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers
Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers
复制标题
直接离子束沉积同位素 Fe/Si 三层膜中的相互扩散
DOI：
10.1063/1.1357151
复制
发表时间：
2001
影响因子：
3.2
通讯作者：
S. Langridge
中科院分区：
文献类型：
--
作者：
N. Telling;C. Faunce;M. Bonder;P. Grundy;D. G. Lord;J. Berg;S. Langridge
使用直接离子束沉积技术，在用不同能量的离子制备的 Fe/Si 三层中检查了相互扩散和混合。沉积同位素纯层并使用自旋极化中子反射率来确定铁扩散在硅化铁形成中的作用。结果发现，形成了一种非磁性硅化铁，其中含有来自三层顶层和底层的 Fe，这表明在间隔区上完全扩散。电子显微镜观察表明，用低能离子（30 eV）制备的薄膜中存在硅化铁相和结晶界面层，而在较高离子能量（100 eV）下则发现混合和非晶状区域。
Interdiffusion and intermixing have been examined in Fe/Si trilayers prepared with ions of different energies, using the direct ion beam deposition technique. Isotope-pure layers were deposited and spin-polarized neutron reflectivity used to determine the role of Fe diffusion in iron silicide formation. It was found that a nonmagnetic iron silicide was formed that contained Fe from both the top and bottom layers in the trilayer, suggesting complete diffusion across the spacer region. Electron microscopy observations revealed the presence of an iron silicide phase and crystalline interface layers in films prepared with low energy ions (30 eV), while mixed and amorphous-like regions were found at higher ion energies (100 eV).