Magnetic hexapole lens focusing of a metastable helium atomic beam for UV-free lithography
Magnetic hexapole lens focusing of a metastable helium atomic beam for UV-free lithography
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用于无紫外线光刻的亚稳态氦原子束的磁性六极透镜聚焦
DOI：
10.1007/s00340-006-2497-2
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发表时间：
2007
期刊：
影响因子：
--
通讯作者：
K. Baldwin
中科院分区：
文献类型：
--
作者：
R. Chaustowski;V. Leung;K. Baldwin
处于激发亚稳态的稀有气体原子源已被用来曝光涂有光刻胶的基底，以演示原子光刻。这些热原子束通常由放电源产生，同时也会产生大量的紫外线辐射。紫外线辐射同时照射基板，并且可以在改变光致抗蚀剂和亚稳态原子方面发挥补充作用。在此报告的实验中，我们使用磁性六极透镜将亚稳态氦原子热束聚焦在阻挡紫外线的基准掩模周围，从而隔离了紫外线成分。这会产生原子光刻曝光，这是原子单独照射的结果。我们还对磁性六极透镜的性能进行了建模，作为原子光刻的潜在有用设备。
Sources of rare gas atoms in excited metastable states have been used to expose photoresist-coated substrates to demonstrate atom lithography. These thermal atomic beams are usually created by discharge sources that also produce copious amounts of UV radiation. The UV radiation simultaneously illuminates the substrate and may play a complementary role in altering the photoresist together with the metastable atoms. In the experiments reported here, we have isolated the UV component using a magnetic hexapole lens to focus a thermal beam of metastable helium atoms around a fiducial mask that blocks the UV light. This creates an atom lithography exposure that is the result of illumination by the atoms alone. We have also modelled the performance of the magnetic hexapole lens as a potentially useful device for atom lithography.