Development of a Novel Instrument for X-Ray Photoelectron Diffraction and Holography

Development of a Novel Instrument for X-Ray Photoelectron Diffraction and Holography
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新型X射线光电子衍射和全息仪的研制

DOI:
10.1142/s0218625x03005207
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发表时间:
2003
影响因子:
1.1
通讯作者:
Y. Nihei
Y. Nihei
中科院分区:
材料科学4区
文献类型:
--
作者:
H. Ishii;S. Shiraki;K. Tamura;W. Chu;M. Owari;R. Shimizu;Y. Nihei

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被引文献

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为进行x射线光电子衍射(XPED)和全息测量,我们研制了一种新型的实验室仪器,该仪器由多能高能x射线源和高能高角分辨光电子能谱仪系统组成。Al-Kα、Cr-Lα和Cu-Kα的光子强度分别为4.6 × 1011 cps、7.5 × 1010 cps和7.2 × 1010 cps。Ag3d XPS还显示,Al-Kα和Cr-Lα源的能量分辨率分别为0.9 eV和3.1 eV。Al-Kα和Cr-Lα激发的h-BN/Ni(111)的XPS和XPED验证了利用该仪器进行XPED和全息分析的潜力和有效性。对SrTiO3(001)表面进行了Cu-Kα激发XPS和Ti1s XPED测量。
For X-ray photoelectron diffraction (XPED) and holography measurements we developed a novel laboratory instrument with the multienergy high power X-ray source and the high energy and high angular resolution photoelectron spectrometer system. The photon intensities of Al–Kα, Cr–Lα and Cu–Kα were estimated at 4.6 × 1011 cps, 7.5 × 1010 cps and 7.2 × 1010 cps, respectively. Ag3d XPS also revealed that the energy resolutions of Al–Kα and Cr–Lα sources were 0.9 eV and 3.1 eV, respectively. XPS and XPED of h-BN/Ni(111) excited by Al–Kα and Cr–Lα elucidated the potential and the validity of the XPED and holography analysis by using this novel instrument. Cu–Kα excitation XPS and Ti1s XPED measurements of the SrTiO3 (001) surface have also been performed.