Three-dimensional optical lithography for photonic microstructures
Three-dimensional optical lithography for photonic microstructures
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DOI：
10.1002/adma.200502286
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发表时间：
2006-06-19
影响因子：
29.4
通讯作者：
Turberfield, Andrew J.
中科院分区：
文献类型：
--
作者：
Scrimgeour, Jan;Sharp, David N.;Turberfield, Andrew J.
Photonic-crystal devices must be precisely aligned within a photonic-crystal lattice. Rapid and flexible optical fabrication of a device embedded in, and in registration with, a 3D photonic crystal is demonstrated. Holographic lithography (see figure) is used to define the underlying periodic microstructure in a single exposure, and two-photon laser writing to create localized structural defects. An intermediate latent image of the photonic crystal is used to align the two exposures.
