Thin solid lubricant film formation by fast atom bombardment sputter deposition
Thin solid lubricant film formation by fast atom bombardment sputter deposition
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通过快速原子轰击溅射沉积形成固体润滑薄膜
DOI：
10.1116/1.573384
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发表时间：
1985
期刊：
影响因子：
--
通讯作者：
K. Nagai
中科院分区：
文献类型：
--
作者：
H. Kuwano;K. Nagai
提出了一种快速原子轰击溅射沉积(FAB-SD)方法来制备MoS_2固体润滑膜并控制其化学计量比。在FAB-SD过程中，目标的充电并不是一个严重的问题。McIlraith类离子源中的束流被证明能够几乎完全中和。采用钼-S复合靶对溅射过程进行化学计量控制。用该靶材沉积的薄膜的耐久性和摩擦系数均优于传统的MoS2靶材沉积的薄膜。用钼S复合靶沉积的退火膜的摩擦系数小于0.0 5。
A fast atom bombardment sputter deposition (FAB‐SD) method is proposed for the formation of MoS2 solid lubricant films and to control their stoichiometry. In the FAB‐SD process, the charging of targets is not a serious problem. The beams in a McIlraith‐type ion source are demonstrated to be capable of almost full neutralization. An Mo–S complex target is used for the purpose of stoichiometric control in the sputtering. Durability and friction coefficients of films deposited using this target are superior to those of films deposited using a conventional MoS2 target. The friction coefficient of the annealed film deposited using the Mo–S complex target is less than 0.05.