Automatic Background Estimation and Quantitative Analysis for XPS Spectrum by Active Shirley Method
Automatic Background Estimation and Quantitative Analysis for XPS Spectrum by Active Shirley Method
复制标题
主动雪莉法XPS谱的自动背景估计和定量分析
DOI：
10.1384/jsa.22.155
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发表时间：
2016
期刊：
影响因子：
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通讯作者：
K. Yoshihara
中科院分区：
文献类型：
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作者：
R. Matsumoto;Yugo Nishizawa;N. Kataoka;Hiromi Tanaka;H. Yoshikawa;S. Tanuma;K. Yoshihara
由于对峰面积估计过高或过低，对背景形状的任意估计会对定量分析的结果产生不利影响。特别是，广泛使用的迭代Shirley法得到的背景强烈依赖于操作者对XPS光谱起始点和结束点的选择。为了减少这种不期望的依赖性，我们专注于主动雪莉方法，该方法在峰值拟合过程中自动调整起点和终点的背景强度。将该方法安装到COMPRO软件中，对bi基超导体中的cu2p谱进行了峰拟合，并对其进行了sio2 / Si薄膜的厚度测定
The arbitrary estimation of the shape of background adversely affects the results of quantitative analysis because of over- or under-estimation of peak area. Especially, the resultant background by the iterative Shirley method that is widely used is strongly dependent on the operator's choice of the starting and ending points on the XPS spectrum. To decrease this undesirable dependency, we focused on the active Shirley method, which automatically adjusts the background intensities at the starting and ending points during the peak fitting process. We installed this method into the COMPRO software and performed the peak fitting of Cu 2p spectrum in Bi-based superconductor and the thickness determination for SiO 2 / Si thin film on