Mechanism of aluminum hydroxide layer formation by surface modification of aluminum
Mechanism of aluminum hydroxide layer formation by surface modification of aluminum
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DOI：
10.1016/j.apsusc.2010.01.011
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发表时间：
2010-05
影响因子：
6.7
通讯作者：
Y. Seo;Young Jung Lee;Dae-gun Kim;Kyu Hwan Lee;Y. Kim
中科院分区：
文献类型：
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作者：
Y. Seo;Young Jung Lee;Dae-gun Kim;Kyu Hwan Lee;Y. Kim
在这项研究中，一种新的，相对简单和快速的制备方法形成的Al（OH）3在Al基板上的薄膜进行了演示。该方法，即，碱表面改性，简单地包括在80 ° C下将基板浸入5 × 10 − 3M NaOH溶液中1分钟，然后将其浸入沸水中30分钟。经碱处理后，在Al基体上形成了Al（OH）3膜，并用XPS和TEM对其化学状态和晶体结构进行了表征。Al（OH）3层由3个区域组成：富非晶区、非晶和晶畴混合区以及靠近Al（OH）3层表面的富晶区。
In this study, a new, relatively simple and rapid fabrication method for forming an Al(OH)3film on Al substrates was demonstrated. This method, i.e., alkali surface modification, is simply comprised of dipping the substrate in a 5×10−3M NaOH solution at 80°C for 1min and then immersing it in boiling water for 30min. After alkali surface modification, an Al(OH)3film was formed on Al substrate, and its chemical state and crystal structure were confirmed by XPS and TEM. The Al(OH)3layer was composed of three regions: an amorphous-rich region, a region of mixed amorphous and crystal domains, and a crystalline-rich region near the Al(OH)3layer surface.