Femtosecond laser direct inscription of 3D photonic devices in Er/Yb-doped oxyfluoride nano-glass ceramics

Femtosecond laser direct inscription of 3D photonic devices in Er/Yb-doped oxyfluoride nano-glass ceramics
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飞秒激光在掺Er/Yb氟氧化物纳米微晶玻璃中直接刻写三维光子器件

DOI:
10.1364/ome.402271
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发表时间:
2020-09
影响因子:
2.8
通讯作者:
J. R. Vázquez de Aldana;C. Romero;Joaquín Fernández;G. Gorni;M. Pascual;A. Durán;R. Balda
J. R. Vázquez de Aldana;C. Romero;Joaquín Fernández;G. Gorni;M. Pascual;A. Durán;R. Balda
中科院分区:
材料科学3区
文献类型:
--
作者:
J. R. Vázquez de Aldana;C. Romero;Joaquín Fernández;G. Gorni;M. Pascual;A. Durán;R. Balda

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研究了飞秒激光直接辐照Er 3 +/Yb 3+氟氧化物纳米微晶玻璃制备光波导。采用单线照射的方法,可以在很宽的激光参数范围内获得具有近高斯模式分布的单模波导,在可见光和近红外波段。在最佳参数(0.34 μJ/pulse和20 μm/s扫描速度)下,在辐照后不退火的情况下,测得的传输损耗为1.6 dB/cm,诱导折射率衬度为Δn = 0.006(800 nm)。的多扫描技术被用来获得控制的折射率分布,从而产生多模态结构。在800 nm的籽晶下诱导了波导的主动行为,并证明了铒发射的共传播引导。还示出了光子元件(诸如Y分束器,在2D和3D中)以及马赫-曾德尔干涉仪的集成。结果表明,Er 3 +/Yb 3+氟氧化物纳米玻璃陶瓷作为主体材料的复杂的有源光子器件的集成飞秒激光照射在低重复率制度的最佳行为。
The fabrication of optical waveguides by direct femtosecond laser irradiation in Er3+/Yb3+ oxyfluoride nano-glass ceramics is investigated. Following the strategy of single line irradiation, a wide range of laser parameters can be used to obtain single-mode waveguides with nearly-gaussian modal profiles, in the visible and near-infrared. Measured propagation loss is 1.6 dB/cm for the optimum parameters (0.34 μJ/pulse and 20 μm/s scanning velocity), with no annealing after irradiation, and the induced refractive index contrast is Δn∼0.006 (at 800 nm). The multi-scan technique is used to gain control of the refractive index profiles thus producing multimodal structures. The active behavior of the waveguides is induced under ∼800 nm seeding and the co-propagating guidance of the erbium emission is demonstrated. The integration of photonic elements such as Y-splitters, both in 2D and 3D, as well as Mach-Zehnder interferometers, is also shown. Results demonstrate the optimum behavior of Er3+/Yb3+ oxyfluoride nano-glass ceramics as a host material for the integration of complex active photonic devices by femtosecond laser irradiation in the low repetition rate regime.