Cubic polytype inclusions in 4H–SiC
Cubic polytype inclusions in 4H–SiC
复制标题
4H-SiC 中的立方多型夹杂物
DOI:
10.1063/1.1534376
复制
发表时间:
2003
影响因子:
3.2
通讯作者:
P. Briddon
中科院分区:
文献类型:
--
作者:
H. Iwata;U. Lindefelt;S. Öberg;P. Briddon
Multiple stacking faults in 4H–SiC, leading to narrow 3C polytype inclusions along the hexagonal c direction, have been studied using an ab initio supercell approach with 96 atoms per supercell. The number of neighboring stacking faults considered is two, three, and four. The wave functions and the two-dimensional energy bands, located in the band gap and associated with the narrow inclusions, can be reconciled with a planar quantum-well model with quantum-well depth equal to the conduction band offset between 3C– and 4H–SiC. We show that the existence of the electronic dipole moment due to the spontaneous polarization leads to a clear asymmetry of the bound wave functions inside the quantum well, and that the perturbation associated with the change in the dipole moment caused by the 3C–like inclusion accounts for the appearance of very shallow localized states at the valence band edge. We have also calculated the stacking fault energies for successive stacking faults. It is found that the stacking fault ...