Effect of thermal annealing on structural and optical properties of titanyl phthalocyanine thin films
Effect of thermal annealing on structural and optical properties of titanyl phthalocyanine thin films
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DOI：
10.1016/j.mssp.2014.06.028
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发表时间：
2014-11-01
影响因子：
4.1
通讯作者：
Khedr, M. Atta
中科院分区：
文献类型：
--
作者：
El-Nahass, M. M.;Afify, H. A.;Khedr, M. Atta
采用热蒸发技术在石英玻璃衬底上制备了酞菁氧钛薄膜。已报道的结构和光学性质的沉积和退火的膜。用X射线衍射（XRD）、场发射扫描电镜（FESEM）和傅里叶变换红外（FT-IR）技术研究了薄膜的结构特征。首次在200-2500 rim波长范围内用分光光度法测量了薄膜的光学常数（折射率n和吸收率k）。在对应于Q带和B或Soret带的1.48 eV和2.5 eV处，所沉积的膜的带隙红移至1.15 eV和2.19 eV。在433 K退火时，薄膜的电阻率分别为100. (C)2014爱思唯尔有限公司版权所有。
Thin films of Litanyl phthalocyanine (TiOPc) have been deposited on both fused quartz and glass substrates by the thermal evaporation technique. The structural and optical properties of the as-deposited and annealed films have been reported. The structural features of the as-deposited and annealed films have been studied by X-ray diffraction (XRD), held-emission scanning electron microscopy (FESEM), and Fourier-transform infrared (FT-lR) technique. The optical constants (refractive index, n, and absorption index, k) of the films have been presented for the first time in the wavelength range 200-2500 rim by using spectrophotometric measurements at nearly normal incidence. The band gaps of the as-deposited film at 1.48 eV and 2.5 eV corresponding to Q-band and B or Soret band were red-shifted to 1.15 eV and 2.19 eV. respectively, when the film annealed at 433 K. (C) 2014 Elsevier Ltd. All rights reserved.