Improvement of photocatalytic activity of tantalum nitride by ammonothermal treatment at high pressure
Improvement of photocatalytic activity of tantalum nitride by ammonothermal treatment at high pressure
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DOI：
10.1016/j.jssc.2012.02.060
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发表时间：
2012-07
影响因子：
3.3
通讯作者：
Kazuhisa Kishida;Tomoaki Watanabe
中科院分区：
文献类型：
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作者：
Kazuhisa Kishida;Tomoaki Watanabe
在823 K、10 ~ 100 MPa氨压条件下，对氮化钽（Ta 3 N5）进行氨处理24 h，以提高其在可见光照射下甲醇水溶液中的光催化析氢活性。所有处理过的Ta 3 N5的析氢速率都比未处理的Ta 3 N5快。在50 MPa以上的高压氨处理条件下，处理后的Ta 3 N5具有更高的析氢活性。处理过的Ta 3 N5的析氢的光催化活性，与缺陷的量有关，是由于减少钽物种。活性的增强是由于表面缺陷的减少，这有助于改善电子从Ta 3 N5表面到负载的Pt助催化剂的转移。
Tantalum nitride (Ta3N5) was treated under ammonothermal conditions with the ammonia pressure of 10 to 100MPa at 823K for 24h to enhance the photocatalytic activity for hydrogen evolution from aqueous methanol solution under visible light irradiation. The rates of hydrogen evolution for all treated Ta3N5were faster than those for untreated Ta3N5. Treated Ta3N5showed higher enhanced activity for hydrogen evolution when treated with high-pressure ammonia at more than 50MPa. The photocatalytic activity for hydrogen evolution of treated Ta3N5, related to the amount of defects, is due to reduced tantalum species. The enhancement in the activity is brought about by a decrease in surface defects, which contributes to improved electron transfer from the surface of Ta3N5to the loaded Pt co-catalyst.