The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films
The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films
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DOI：
10.1063/1.2957034
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发表时间：
2008-07-14
影响因子：
4
通讯作者：
Iacona, F.
中科院分区：
文献类型：
--
作者：
Lo Savio, R.;Miritello, M.;Iacona, F.
我们报道了在1200 ℃的N（2）或O（2）气氛中进行热退火对具有不同成分（Er（2）SiO（5）、Er（2）Si（2）O（7）及其混合物）的Er硅酸盐薄膜的结构和光学性质的影响。我们表明，化学计量比的薄膜的化学成分被保存后的热处理。热退火后形成的所有不同的晶体结构被识别。O（2）中的热处理导致光致发光强度的强烈增强，这归因于缺陷密度的有效降低。特别地，最高的光学效率与Er（2）Si（2）O（7）的α相中的Er离子相关。(C)2008年美国物理学会。
We report the effects of thermal annealing performed in N(2) or O(2) ambient at 1200 degrees C on the structural and optical properties of Er silicate films having different compositions (Er(2)SiO(5), Er(2)Si(2)O(7), and their mixture). We demonstrate that the chemical composition of the stoichiometric films is preserved after the thermal treatments. All different crystalline structures formed after the thermal annealing are identified. Thermal treatments in O(2) lead to a strong enhancement of the photoluminescence intensity, owing to the efficient reduction of defect density. In particular the highest optical efficiency is associated to Er ions in the alpha phase of Er(2)Si(2)O(7). (C) 2008 American Institute of Physics.