Urbach absorption edge of silica: reduction of glassy disorder by fluorine doping
Urbach absorption edge of silica: reduction of glassy disorder by fluorine doping
复制标题
二氧化硅的乌尔巴赫吸收边：通过氟掺杂减少玻璃态无序
DOI：
10.1016/j.jnoncrysol.2004.08.038
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发表时间：
2004
影响因子：
3.5
通讯作者：
H. Hosono
中科院分区：
文献类型：
--
作者：
L. Skuja;K. Kajihara;Y. Ikuta;M. Hirano;H. Hosono
在室温下，在吸收系数范围（1cm−1 ~ 500cm−1）内，研究了“湿”、“干”、570和6010ppm氟掺杂的四种合成硅玻璃的真空紫外基吸收边（“乌尔巴赫边”）。吸收边呈指数形式，符合厄巴赫规则。与未掺杂的二氧化硅相比，氟掺杂后真空紫外线透明度的增加是由于吸收边缘更陡峭（更短的“乌尔巴赫尾”）。掺入f -二氧化硅的边缘斜率在较低掺杂浓度（570ppm）时已经增加，在掺入6010ppm的玻璃中斜率没有进一步增加。这些发现表明，f掺杂二氧化硅的真空紫外透明度的提高是由于玻璃化无序和应变Si-O键对吸收边宽度的贡献减少。
The vacuum-ultraviolet fundamental absorption edge (‘Urbach edge’) of four types of synthetic silica glasses, ‘wet’, ‘dry’, and doped by 570 and 6010ppm wt. fluorine, was studied in the absorption coefficient range (1cm−1–500cm−1) at room temperature. The absorption edge has exponential form in agreement with the Urbach’s rule. The well-documented increase of vacuum-ultraviolet transparency upon fluorine doping is due to a steeper absorption edge (shorter ‘Urbach tail’) as compared to undoped silicas. The increase of the edge slope in F-doped silica occurs already the lower dopant concentration (570ppm), the slope does not increase further in the 6010ppm doped glass. These findings show that the improved vacuum UV transparency of F-doped silicas is due to the decreased contribution of the glassy disorder and strained Si–O bonds to the width of the absorption edge.