High-speed measurements using optical profiler

High-speed measurements using optical profiler
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使用光学轮廓仪进行高速测量

DOI:
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发表时间:
2003
期刊:
SPIE Optical Metrology
影响因子:
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通讯作者:
J. Schmit
J. Schmit
中科院分区:
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文献类型:
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作者:
J. Schmit

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我们提出了一个分析的质量白色光干涉测量使用光学轮廓仪增加扫描速度高达每秒100微米。质心方法被选择用于白色光条纹分析,因为它是计算最快的方法之一。速度的增加需要照明源的光谱带宽的减小。只有特定的采样率(扫描仪速度)才能产生合适的结果来找到白色光条纹包络的位置。采样率、光谱带宽、噪声、振动和相机积分时间都影响测量质量。虽然精确校准扫描仪是实现精确测量的一种方法,但我们的首选方法是在测量期间确定扫描仪速度,然后在算法中利用此信息。除了确保高精度的测量,这种方法避免了微妙和微调,伴随着扫描仪的校准。我们的光学轮廓仪系统允许从每秒4.8微米到每秒100微米的可变扫描速率,当使用较慢的扫描速率时,可以产生非常精确的测量,非常快速的测量,具有很高的可重复性或速度和精度的任何组合,具体取决于扫描速率。我们发现,这种精度和速度的组合,使该系统非常适合工业测量的样品高度范围从数百纳米到8毫米。
We present an analysis of the quality of white light interferometric measurements using an optical profiler with increased scan speeds up to 100 microns per second. A centroid approach was chosen for the white light fringe analysis because it is among the quickest to compute. The increase in speed requires a decrease in the spectral bandwidth of the illumination source. Only certain sampling rates (scanner speeds) yield suitable results for finding the position of the white light fringe envelope. Sampling rate, spectral bandwidth, noise, vibration and camera integration time all influence the quality of the measurements. Although precisely calibrating the scanner is one approach for achieving accurate measurements, our preferred method is determining the scanner speed during the measurement and then utilizing this information in the algorithm. Besides assuring highly accurate measurements this method avoids the delicacy and fine tuning that accompanies the calibration of the scanner. Our optical profiler system allows variable scan rates from 4.8 microns per second all the way up to 100 microns per second, which yields very precise measurements when a slower scan rate is used, extremely fast measurements with still high repeatability or any combination of speed and accuracy depending on the scan rate. We find that this combination of precision and speed make this system quite well suited for industrial measurement of a wide range of sample heights from hundreds of nanometers up to eight millimeters.