Electrical Characteristics of Hole Resonant Tunneling Diodes with High Ge Fraction (x>0.4) Si/Strained Si_<1-x>Ge_x/Si(100) Heterostructure"

Electrical Characteristics of Hole Resonant Tunneling Diodes with High Ge Fraction (x>0.4) Si/Strained Si_<1-x>Ge_x/Si(100) Heterostructure"
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高Ge分数(x>0.4) Si/应变Si_<1-x>Ge_x/Si(100)异质结空穴谐振隧道二极管电特性"

DOI:
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发表时间:
2008
期刊:
Appl.Surf.Sci. Vol.254、No.19
影响因子:
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通讯作者:
J.Murota
J.Murota
中科院分区:
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文献类型:
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作者:
T.Seo、M.Sakuraba;J.Murota

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