Thin Film Nanoprocessing by Laser/STM Combination

Thin Film Nanoprocessing by Laser/STM Combination
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激光/STM 组合薄膜纳米加工

DOI：
10.1002/pssa.2211450213
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发表时间：
1994
期刊：
影响因子：
--
通讯作者：
W. Pompe
W. Pompe
中科院分区：
--
文献类型：
--
作者：
A. A. Gorbunov;W. Pompe

文献摘要

被引文献

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提出了一种激光直写纳米结构的新技术。该技术基于扫描隧道显微镜尖端附近的光辐射的局部强度增强，并且允许克服传统透镜聚焦光束的基本光斑限制（约波长λ的一半）。在第一个实验结果中，为了增加效果，使用了非常规的银尖端。通过使用λ = 800 nm的激光，在金膜表面上可逆地写入直径为10至40 nm的特征。简要总结了微小导电物体近场增强光辐射的理论可能性和机制。 [俄语文本被忽略]。
A new technique of laser direct writing of nanoscale structures is proposed. The technique is based on a local intensity enhancement of optical radiation near a tip of a scanning tunneling microscope and allows to overcome the fundamental spot limitation (about a half of the wavelength λ) of the conventional lens-focused beams. In the first experimental results unconventional tips of silver are used in order to increase the effect. By using a laser with λ = 800 nm features of 10 to 40 nm in diameter are reversibly written on the surface of gold films. Theoretical possibilities and mechanisms of the near-field enhancement of optical radiation by very small conductive objects are briefly summarized. [Russian Text Ignored].