Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C2H2 and Ne/C2H2 mixture
Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C2H2 and Ne/C2H2 mixture
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DOI：
10.7567/jjap.55.07le02
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发表时间：
2016-06
影响因子：
1.5
通讯作者：
T. Kimura;H. Kamata
中科院分区：
文献类型：
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作者：
T. Kimura;H. Kamata
采用Ar/C_2H_2和Ne/C_2H_2混合气体的高密度脉冲等离子体，在0.5 ~ 2 Pa的总压范围内制备了氢化类金刚石薄膜。等离子体是使用反应高功率脉冲磁控溅射（HiPIMS）系统产生的。在余辉模式下，向基板施加−500 V的负脉冲电压，持续15 µs。生长速率并不强烈地依赖于环境气体的类型，但随着C2 H2分数的增加，在C2 H2分数为10%和总压力为2 Pa时，生长速率显著增加至约2.7 µm/h。生长速率的显著增加意味着HiPIMS系统可以被视为化学气相沉积工艺的等离子体源。在相同的工作条件下，Ne/C_2H_2等离子体制备的薄膜的硬度略高于Ar/C_2H_2等离子体制备的薄膜的硬度，并且随着气压的增加，两者的差异逐渐增大。用Ne/C_2H_2等离子体制备的薄膜的硬度在11 ~ 18 GPa之间。在拉曼光谱中，两个非常宽的重叠带被指定为G（石墨）和D（无序）带。G带的峰位基本上与总压无关，而G峰的半高宽总体上随总压的增加而减小。
Hydrogenated diamond-like carbon films are prepared using reactive high-density pulsed plasmas of Ar/C2H2 and Ne/C2H2 mixture in the total pressure range from 0.5 to 2 Pa. The plasmas are produced using a reactive high-power impulse magnetron sputtering (HiPIMS) system. A negative pulse voltage of −500 V is applied to the substrate for a period of 15 µs in the afterglow mode. The growth rate does not strongly depend on the type of ambient gas but it markedly increases to about 2.7 µm/h at a C2H2 fraction of 10% and a total pressure of 2 Pa with increasing C2H2 fraction. The marked increase in the growth rate means that the HiPIMS system can be regarded as a plasma source for the chemical vapor deposition process. The hardness of the films prepared by Ne/C2H2 plasmas is somewhat higher than that of the films prepared by Ar/C2H2 plasmas under the same operating conditions, and the difference becomes larger as the pressure increases. The hardness of the films prepared by Ne/C2H2 plasmas ranges between 11 and 18 GPa. In the Raman spectra, two very broad overlapping bands are assigned as the G (graphite) and D (disorder) bands. The peak position of the G band is roughly independent of the total pressure, whereas the FWHM of the G peak decreases with increasing total pressure as a whole.