Study on Sputtering Mechanism of Shave-off Profiling
Study on Sputtering Mechanism of Shave-off Profiling
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刮削仿形溅射机理研究
DOI:
10.1380/ejssnt.2011.386
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发表时间:
2011
影响因子:
0.7
通讯作者:
M.Fujii
中科院分区:
文献类型:
--
作者:
Takeo Ito;Kazuhiro Ozawa;Tsuyoshi Watanabe;Takeshi Sagiya;小澤和浩・鷺谷威;M. Fujii and M. Owari;M. Fujii M. Owari;M.Fujii