Radiation-induced reactions in novolak-based chemically amplified resists.
Radiation-induced reactions in novolak-based chemically amplified resists.
复制标题
基于酚醛清漆的化学放大抗蚀剂中的辐射诱导反应。
DOI：
10.2494/photopolymer.8.37
复制
发表时间：
1995
影响因子：
0.8
通讯作者：
S. Tagawa
中科院分区：
文献类型：
--
作者：
T. Kozawa;M. Uesaka;Takeo Watanabe;Y. Yamashita;Y. Yoshida;S. Tagawa
本文用脉冲辐解法研究了酚醛树脂基化学放大抗蚀剂中的辐射诱导反应，辐照时间范围从皮秒到几分钟。在化学放大电子束和X射线抗蚀剂中，鎓盐的电子清除效应延迟了阳离子中间体与电子的复合，并延长了阳离子中间体的寿命。用电子束曝光法在400 nm处观察到酚醛清漆的苯氧基自由基吸收。认为酚醛清漆的质子加合物和苯氧基自由基是通过酚醛清漆与其自由基阳离子之间的离子-分子反应形成的。此外，在酚醛清漆基化学放大抗蚀剂中观察到长寿命的中间体。
Radiation-induced reactions in novolak-based chemically amplified resists have been studied by means of pulse radiolysis in the time ranges from the order of picoseconds to that of minutes. In the chemically amplified electron beam and X-ray resists, the electron scavenging effect of onium salts delays the recombination of cationic intermediates with electrons and prolongs the lifetime of the cationic intermediates. The absorption due to an phenoxyl radical of novolak was observed at 400nm by electron beam exposure. It is thought that the proton adducts and phenoxyl radicals of novolak were formed by ion-molecular reactions between novolak and its radical cations. Furthermore, long-lived intermediates were observed in the novolak-based chemically amplified resists.