Rutile thin film responsive to visible light and with high UV light sensitivity
Rutile thin film responsive to visible light and with high UV light sensitivity
复制标题
金红石薄膜对可见光敏感且具有高紫外光敏感性
DOI：
10.1007/s10853-008-3185-x
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发表时间：
2009
影响因子：
4.5
通讯作者：
Mitsunobu Sato
中科院分区：
文献类型：
--
作者：
H. Nagai;Sohei Aoyama;H. Hara;C. Mochizuki;I. Takano;N. Baba;Mitsunobu Sato
在石英玻璃衬底上制备了100 nm厚的金红石透明薄膜；在相同条件下，与溶胶-凝胶法制备的锐钛矿薄膜相比，该薄膜对可见光有响应，对紫外光有更高的灵敏度。通过x射线衍射、拉曼光谱和透射电子显微镜的观察确定了晶体结构。根据XPS峰，金红石薄膜的氧/钛比为1.78。通过测定亚甲基蓝在水溶液中脱色的准一级速率和光接触角，考察了金红石薄膜的光反应性和光致亲水性。缺乏o的金红石薄膜具有较高的光反应性和光敏性，其光带边缘和折射率分别为3.10 eV和2.2，这是由于电子陷阱和金红石颗粒中的o缺陷所辅助的。
A transparent rutile thin film 100 nm thick was fabricated on a quartz glass substrate; it was responsive to visible light and had a higher sensitivity to UV light than an anatase thin film formed by sol–gel method under identical conditions. The crystal structure was determined by observations using X-ray diffraction, Raman spectra, and a transmission electron microscope. The oxygen/titanium ratio of the rutile thin films was 1.78 according to the XPS peaks. The photoreactivity and photoinduced hydrophilicity of the rutile thin films was examined by measuring the pseudo first-order rate for the decoloration of methylene blue in an aqueous solution and the water contact angle, respectively. The high photoreactivity and photosensitivity of the O-deficient rutile thin film, whose optical band edge and refractive index were 3.10 eV and 2.2, respectively, were due to electron traps and assisted by O-defects within the rutile particles.