Surface modifications of polyvinylidene fluoride (PVDF) under rf Ar plasma
Surface modifications of polyvinylidene fluoride (PVDF) under rf Ar plasma
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DOI：
10.1016/s0141-3910(97)00130-4
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发表时间：
1998-01-01
影响因子：
5.9
通讯作者：
Pop, T
中科院分区：
文献类型：
--
作者：
Duca, MD;Plosceanu, CL;Pop, T
利用X射线光电子能谱（XPS）和原子力显微镜（AFM）研究了射频氩等离子体对聚偏氟乙烯（PVDF）表面的改性。还进行了PVDF表面上的水接触角测量。XPS分析表明，等离子体处理导致PVDF的脱氢和氧进入聚合物表面，而AFM图像显示表面粗糙化。接触角测量和表面自由能计算表明等离子体处理后的PVDF表面润湿性的改善。射频Ar等离子体处理后的PVDF的F（1 s）/C（1 s）比和水接触角下降，表面粗糙度和自由能增加，证明化学和物理效应在粘附中起着重要作用。(C)1998年爱思唯尔科学有限公司。All rights reserved.
The surface modifications of polyvinylidene fluoride (PVDF) induced by rf Ar plasma treatment have been investigated using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Water contact angle measurements on PVDF surfaces were also performed. The XPS analysis shows that the plasma treatment causes dehydrofluorination of PVDF and the incorporation of oxygen into the polymer surface, while the AFM images reveal surface roughening. Contact angle measurements and surface free energy calculations show an improvement in the PVDF surface wettability after the plasma treatment. The decrease of F(1s)/C(1s) ratio and water contact angle and the increase of surface roughness and free energy for rf Ar plasma-treated PVDF prove that both chemical and physical effects play an important role in the adhesion. (C) 1998 Elsevier Science Limited. All rights reserved.