Retention, re-emission and thermal desorption of He implanted into pyrolytic graphite
Retention, re-emission and thermal desorption of He implanted into pyrolytic graphite
复制标题
注入热解石墨的 He 的保留、再发射和热解吸
DOI：
10.1016/0022-3115(82)90287-2
复制
发表时间：
1982
影响因子：
3.1
通讯作者：
J. Ehrenberg
中科院分区：
文献类型：
--
作者：
W. Möller;B. Scherzer;J. Ehrenberg
在120 K和295 K温度下，将8 keV ~ 3 He离子注入到边缘取向热解石墨中。通过核反应和残余气体分析观察到的保留行为与在金属中观察到的保留行为明显不同。尽管反射系数可以忽略不计，但在室温下，低注量下的平均再发射系数约为30%，在注量为1.5 × 1017 cm-2时相对最大。在5 × 1017 cm ~（12）以上的注量下观察到饱和现象。注入的He通过退火到750 K被完全去除。在室温下的再植入显示出在低注量下的增强的保留（~90%）。实验结果进行了讨论，在他的扩散，捕获在损伤部位和可能的材料结构的变化。
8 keV3He ions have been implanted into edge-oriented pyrolytic graphite at temperatures of 120 K and 295 K. The retention behavior observed by nuclear reaction and residual gas analyses differs markedly from that observed in metals. Despite the negligible reflection coefficient, the mean re-emission coefficient at low fluence amounts to ~30% at room temperature, with a relative maximum at a fluence of 1.5 × 1017cm−2. Saturation is observed at fluences above 5 × 1017cm12. The implanted He is completely removed by annealing to 750 K. Reimplantation at room temperature shows an enhanced retention (~90%) at low fluences. The experimental results are discussed in terms of He diffusion, trapping at damage sites and possible structural changes of the material.