Schottky barrier modulation of a GaTe/graphene heterostructure by interlayer distance and perpendicular electric field
Schottky barrier modulation of a GaTe/graphene heterostructure by interlayer distance and perpendicular electric field
复制标题
通过层间距离和垂直电场对 GaTe/石墨烯异质结构进行肖特基势垒调制
DOI:
10.1088/1361-6528/ab2d67
复制
发表时间:
2019-10-04
期刊:
影响因子:
3.5
通讯作者:
Wang, Haiying
中科院分区:
文献类型:
--
作者:
Li, Hengheng;Zhou, Zhongpo;Wang, Haiying
Two-dimensional materials have recently been the focus of extensive research. Graphene-based vertical van der Waals heterostructures are expected to design and fabricate novel electronic and optoelectronic devices. Monolayer gallium telluride is a graphene-like nanosheet synthesized in experiment. Here, the electronic properties of GaTe/graphene heterostructures are investigated under the interlayer coupling and the applied perpendicular electric field. The results show that the electronic properties of GaTe and graphene are preserved, and the energy bandgap of graphene is opened to 13.5 meV in the GaTe/graphene heterostructure. It is found that the n-type Schottky contact is formed in the GaTe/graphene heterostructure, which can be tuned by the interlayer coupling, and the applied electric field. Moreover, a transformation from n-type to p-type Schottky contact is observed when the interlayer distance is smaller than 3.15 Å or the applied electric field is larger than 0.05 V Å−1. These properties are fundamental to the design of new Schottky nanodevices based on the GaTe/graphene heterostructure.