Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle
Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle
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DOI：
10.1063/1.3184785
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发表时间：
2009-07
影响因子：
4
通讯作者：
J. Chalupský;V. Hájková;V. Altapova;T. Burian;A. Gleeson;L. Juha;M. Jurek;H. Sinn;M. Störmer;R. Sobierajski;K. Tiedtke;S. Toleikis;T. Tschentscher;L. Vyšín;H. Wabnitz;J. Gaudin
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文献类型：
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作者：
J. Chalupský;V. Hájková;V. Altapova;T. Burian;A. Gleeson;L. Juha;M. Jurek;H. Sinn;M. Störmer;R. Sobierajski;K. Tiedtke;S. Toleikis;T. Tschentscher;L. Vyšín;H. Wabnitz;J. Gaudin
我们目前的损伤研究结果进行的自由电子激光器在汉堡（FLASH）设施与13.5 nm（91.8 eV）和7 nm（177.1 eV）的辐射。激光束聚焦在890 nm厚的无定形碳样品上，该样品覆盖在模仿x射线镜的硅晶片上。石墨化的通量阈值被确定为不同的掠射角以上和以下的临界角。所观察到的角度依赖性Fth的解释吸收深度和反射率的变化。此外，所需的相变导致石墨化的吸收局部剂量示出随辐射波长。
We present results of damage studies conducted at the Free Electron LASer in Hamburg (FLASH) facility with 13.5 nm (91.8 eV) and 7 nm (177.1 eV) radiations. The laser beam was focused on a sample of 890-nm-thick amorphous carbon coated on a silicon wafer mimicking a x-ray mirror. The fluence threshold for graphitization was determined for different grazing angles above and below the critical angle. The observed angular dependence of Fth is explained by the variation in absorption depth and reflectivity. Moreover, the absorbed local dose needed for the phase transition leading to graphitization is shown to vary with the radiation wavelength.