Simulation of an aperture in the thick metallic screen that gives high intensity and small spot size using surface plasmon polariton

Simulation of an aperture in the thick metallic screen that gives high intensity and small spot size using surface plasmon polariton
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DOI:
10.1046/j.1365-2818.2003.01155.x
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发表时间:
2003-06
影响因子:
2
通讯作者:
K. Tanaka;M. Tanaka
K. Tanaka;M. Tanaka
中科院分区:
工程技术4区
文献类型:
--
作者:
K. Tanaka;M. Tanaka

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通过三维计算机模拟检查厚金属屏幕中亚波长孔径周围的光波行为。将金属屏幕视为具有复值介电常数的电介质板,可以设计一个孔径,通过激发孔径侧壁上的表面等离子体激元,同时提供高强度和小光斑尺寸。
The optical wave behaviour around a subwavelength aperture in a thick metallic screen is examined through three‐dimensional computer simulation. Treating the metallic screen as a dielectric slab with complex‐valued permittivity, it is possible to design an aperture that simultaneously provides high intensity and small spot size through the excitation of surface plasmon polaritons on the side walls of the aperture.