Controlled two-dimensional distribution of nanoparticles by spin-coating method
Controlled two-dimensional distribution of nanoparticles by spin-coating method
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DOI：
10.1063/1.1445811
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发表时间：
2002-02-04
影响因子：
4
通讯作者：
Koo, JY
中科院分区：
文献类型：
--
作者：
Hong, YK;Kim, H;Koo, JY
我们证明，通过旋涂的方法可以实现纳米颗粒的可控分布。通过这种方法，Co和Ag纳米粒子均匀地分布在Si和SiO_2衬底上。颗粒密度可通过改变胶体的浓度来控制。图案化区域内纳米粒子的空间分布均匀，边界效应小，这对当前的微电子技术是有利的。我们认为旋涂方法可以用于开发未来纳米器件的大规模生产工艺。(C)2002年美国物理研究所。
We demonstrate that the controlled distribution of nanoparticles can be achieved by employing the spin-coating method. The Co and Ag nanoparticles were uniformly distributed on the Si and SiO2 substrates with this method. The particle density was controllable by varying the concentration of colloids. The spatial distribution of the nanoparticles within the patterned area was also shown to be uniform with small boundary effect, which is favorable for current microelectronics technology. We propose that the spin-coating method can be utilized in developing mass production processes for future nanodevices. (C) 2002 American Institute of Physics.