Angular Distribution of Sputtered Material
Angular Distribution of Sputtered Material
复制标题
溅射材料的角度分布
DOI：
10.1063/1.1735395
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发表时间：
1960
影响因子：
3.2
通讯作者：
D. Rosenberg
中科院分区：
文献类型：
--
作者：
G. Wehner;D. Rosenberg
测量了在正常汞离子入射下，从100 ~ 1000 ev的平面多晶靶上溅射的材料的角分布，并绘制了极性图。分布在余弦下，接近余弦分布，在更高的离子能量下。Mo和Fe比Ni和Pt更倾向于向侧面溅射。在斜离子入射下，原子优先向正向溅射。
The angular distribution of material sputtered under normal Hg+‐ion incidence from flat, polycrystalline targets at 100 to 1000 ev was measured and plotted in polar diagrams. The distribution is ``under cosine,'' approaching a cosine distribution, at higher ion energies. Mo and Fe show a more pronounced tendency to eject to the sides than Ni or Pt. Under oblique ion incidence atoms are sputtered preferentially in the forward direction.