Formation of Nitrogen Oxides by Nanosecond Pulsed Plasma Discharges in Gas–Liquid Reactors
Formation of Nitrogen Oxides by Nanosecond Pulsed Plasma Discharges in Gas–Liquid Reactors
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DOI:
10.1007/s11090-019-09981-w
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发表时间:
2019-05
影响因子:
3.6
通讯作者:
R. Wandell;Huihui Wang;R. Bulusu;Rachel O. Gallan;B. Locke
中科院分区:
文献类型:
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作者:
R. Wandell;Huihui Wang;R. Bulusu;Rachel O. Gallan;B. Locke
A gas–liquid-film flow reactor with a nanosecond pulsed power supply was utilized to produce nitrogen oxides from Ar/N2mixtures (gas phase) and deionized water (liquid phase). Chemical analysis of the stable products found in both the gas and liquid phases was performed and chemical quenching was incorporated for the liquid phase samples in order to eliminate post plasma reactions. Significant amounts of NO and NO2in the gas phase andandin the liquid phase were determined using FTIR spectroscopy and ion chromatography, respectively. The production rate of all nitrogen oxides produced increased significantly with N2concentration while H2O2formation decreased slightly. The gas temperature of the plasma was approximately 525 K and was unaffected by N2concentration while the electron density ranged from 1 × 1017cm−3in pure Ar to 5.5 × 1017cm−3in 28% N2. The role of thein the reaction pathway was assessed by adding CO as a gas phase radical scavenger showing thatis essential for conversion of the gas phase NO and NO2into water solubleand. Conversely, atomic oxygen originating from water is likely responsible for NO and NO2generation. Experiments with N2/O2/Ar mixtures and air showed a significant increase in NO2production caused by the additional generation of reactive oxygen species. An overall energy yield for all nitrogen oxides produced in the most efficient case was 50 eV/molecule.