Influence of In/Ga intermixing on the optical properties of InGaAs/GaAs quantum dots
Influence of In/Ga intermixing on the optical properties of InGaAs/GaAs quantum dots
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DOI:
10.1016/s0022-0248(98)00698-8
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发表时间:
1998-12-01
影响因子:
1.8
通讯作者:
Bimberg, D
中科院分区:
文献类型:
--
作者:
Heinrichsdorff, F;Grundmann, M;Bimberg, D
We report on the impact of thermal annealing of buried InGaAs quantum dots (QDs) on the eigenstate energies and their inhomogeneous broadening due to size fluctuations. Application of annealing temperatures (T-A) of up to 700 degrees C for 30 min results in a blue shift of the QD ground state luminescence of 150 meV accompanied by a strong reduction of sublevel separation and inhomogeneous broadening. At the same time the wetting layer luminescence is only slightly shifted, resulting in a strongly decreased localization energy of the QDs. With increasing annealing temperature the photoluminescence peak broadening due to the QDs size distribution shows a distinct maximum and subsequently decreases below the value of as grown QDs. These observations qualitatively agree with calculations for a simple model system of spherical QDs assuming Fickian interdiffusion of dot and barrier material. Our results demonstrate that the growth temperatures (T-Gr) applied after deposition of the QDs strongly affect their properties. Thus for fabrication of QD based devices in the InGaAs/GaAs system a compromise for the choice of TGr has to be made in order to achieve both high carrier localization energies in the QDs (low T-Gr) and high material quality of the cap layers (high T-Gr). (C) 1998 Elsevier Science B.V. All rights reserved.