A molecular dynamics simulation of wear mechanism of diamond tool in nanoscale cutting of copper beryllium
A molecular dynamics simulation of wear mechanism of diamond tool in nanoscale cutting of copper beryllium
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DOI：
10.1007/s00170-018-03246-0
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发表时间：
2019-01
期刊：
影响因子：
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通讯作者：
A. Sharma;D. Datta;R. Balasubramaniam
中科院分区：
文献类型：
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作者：
A. Sharma;D. Datta;R. Balasubramaniam
采用分子动力学模拟方法研究了单晶金刚石刀具纳米切削铜铍合金时的磨损机理。两个边缘配置，即，锋利和磨损的工具，被选择来研究纳米切削CuBe过程中的工具和工件的相互作用。此外，研究涉及的实验表征技术，即。扫描电子显微镜（SEM），能量色散X射线光谱（EDS），和拉曼光谱，以确认模拟结果。分子动力学模拟（MDS）的结果表明，作为工件材料中的硬颗粒的Be的存在影响的切削力，随后导致退化的金刚石工具的锋利的边缘。此外，从工具中去除的碳（C）原子与Be颗粒反应，结果导致形成碳化铍（BeC）。与工具的钝边缘配置的相互作用导致工具边缘处的非晶化。在CuBe上使用的金刚石工具的拉曼光谱揭示了在工具边缘处金刚石的非晶化的类似现象。此外，表面生成取决于工具边缘条件，因为与由锋利边缘配置生成的表面相比，钝边缘工具导致更光滑的表面。
In the present study, molecular dynamics simulation (MDS) is employed to study the wear mechanism of single crystal diamond tool during nanocutting of copper beryllium (CuBe). Two edge configurations, i.e., both sharp and worn out tools, are chosen to study the tool and workpiece interaction during the nanocutting of CuBe. Further, the study involves the experimental characterization techniques viz. scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and Raman spectroscopy to confirm the simulation results. The results of the molecular dynamics simulation (MDS) show that the presence of Be as a hard particle in workpiece material influences the cutting forces which subsequently causes degradation of the sharp edge of the diamond tool. Furthermore, the carbon (C) atoms removed from the tool react with Be particles and as a result, it causes the formation of beryllium carbide (BeC). Beryllium interaction with the blunt edge configuration of the tool causes amorphization at the tool edge. Raman spectroscopy of the used diamond tool on CuBe reveals the similar phenomena of amorphization of the diamond at the tool edge. Moreover, surface generation is dependent on the tool edge condition as blunt edge tool leads to smoother surface compared to the surface generated by sharp edge configuration.