The film formation dynamics in spin coating
The film formation dynamics in spin coating
复制标题
旋涂中的成膜动力学
DOI：
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发表时间：
1989
期刊：
影响因子：
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通讯作者：
H. Ohashi
中科院分区：
文献类型：
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作者：
T. Ohara;Y. Matsumoto;H. Ohashi
研究了使用旋涂工艺形成薄膜的情况。制定了具有适用边界条件的液膜和周围气相二维（2-D）全控制方程。考虑了气相和液相以及自由表面上发生的传热和传质，包括溶剂的蒸发。然后根据变量径向依赖性将控制方程和边界条件简化为一维情况。利用一维控制方程对从旋转开始到涂膜干燥结束的详细成膜过程进行了数值模拟。目前的数值分析阐明了各种工艺参数（例如旋转速度、初始溶质浓度和盘加热）的复杂影响。结果发现，最终膜厚主要决定于径向对流导致的膜减薄率与溶剂蒸发导致的膜减薄率处于同一数量级时。
Thin film formation using the process of spin coating is investigated. The liquid film and surrounding gas phase two‐dimensional (2‐D) full governing equations with applicable boundary conditions are formulated. The heat and mass transfer that occurs in the gas and liquid phase and across the free surface, including the evaporation of solvent, are taken into account. The governing equations and boundary conditions are then reduced to a 1‐D case based on the variables radial dependency. The detailed film formation process that commences at the start of the spinning and ends with the dry‐up of the coated film is numerically simulated by utilizing the 1‐D governing equations. The complex effects of various process parameters, e.g., spinning speed, initial solute concentration, and disk heating, are clarified by the present numerical analysis. It was found that the final film thickness is mainly determined at the time when the film thinning rate resulting from radial convection has the same order as the film thinning rate resulting from solvent evaporation.