Potential sputtering of lithium fluoride by slow multicharged ions.
Potential sputtering of lithium fluoride by slow multicharged ions.
复制标题
缓慢的多电荷离子可能溅射氟化锂。
作者：
Neidhart;Pichler;Aumayr;Winter;Schmid;Varga
多晶 LiF 薄膜受到缓慢的 $(ensuremath{le}1$ keV) 多电荷 ${mathrm{Ar}}^{q+}$ 离子 $(qensuremath{le}9)$ 轰击，以便通过石英晶体微天平研究所得的总溅射产额。超过 99% 的溅射粒子是中性的，并且在给定的冲击能量下，其产量与射弹离子的势能成正比。相应的“潜在溅射”过程已经在远低于 100 eV 的冲击能量下发生。它可能与多电荷离子捕获电子后 LiF 中缺陷的产生有关，并且每 100 eV 的射弹势能去除约一个 LiF 分子。
Thin polycrystalline LiF films have been bombarded by slow $(ensuremath{le}1$ keV) multicharged ${mathrm{Ar}}^{q+}$ ions $(qensuremath{le}9)$, in order to study the resulting total sputter yields by means of a quartz crystal microbalance. More than 99% of sputtered particles are neutral and show yields, at given impact energy, in proportion to the potential energy of projectile ions. The respective ``potential sputtering' process already takes place far below 100 eV impact energy. It can be related to defect production in LiF following electron capture by the multicharged ions, and removes about one LiF molecule per 100 eV of projectile potential energy.