Effective Resistivity in Collisionless Magnetic Reconnection.

Effective Resistivity in Collisionless Magnetic Reconnection.
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无碰撞磁重联中的有效电阻率

DOI:
10.1038/s41598-018-28851-7
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发表时间:
2018-07-12
期刊:
影响因子:
4.6
通讯作者:
Yu MY
Yu MY
中科院分区:
综合性期刊3区
文献类型:
--
作者:
Ma ZW;Chen T;Zhang HW;Yu MY

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提出了一种与等离子体中无碰撞磁重联有关的有效电阻率。它是基于这样的论点,即在X线周围的小电子扩散区域中的电子的俯仰角散射可以导致在无碰撞等离子体中的有效电阻率。这样得到的有效电阻率是局部等离子体和磁场参数的幂律形式。直接无碰撞粒子模拟(PIC)证实了其有效性。该结果与大量易受MR影响的环境的电阻率(从现有数据中获得)非常一致:从星系间和星际到太阳和地球到实验室聚变等离子体。标度律可以很容易地纳入现有的碰撞磁流体动力学模拟代码,调查无碰撞MR,以及作为一个指导托亚布initiotheoretical调查的无碰撞MR过程。
An effective resistivity relevant to collisionless magnetic reconnection (MR) in plasma is presented. It is based on the argument that pitch angle scattering of electrons in the small electron diffusion region around the X line can lead to an effective, resistivity in collisionless plasma. The effective resistivity so obtained is in the form of a power law of the local plasma and magnetic field parameters. Its validity is confirmed by direct collisionless particle-in-cell (PIC) simulation. The result agrees very well with the resistivity (obtained from available data) of a large number of environments susceptible to MR: from the intergalactic and interstellar to solar and terrestrial to laboratory fusion plasmas. The scaling law can readily be incorporated into existing collisional magnetohydrodynamic simulation codes to investigate collisionless MR, as well as serve as a guide toab initiotheoretical investigations of the collisionless MR process.
神光二号设施激光驱动磁重联过程中超阿尔芬电子射流的形成:细胞内粒子模拟
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